Hat

United States Patent D892,457

Drawing figure from US Patent D892,457, Hat
Drawing figure from US D892,457
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What this patent covers

A design patent covering the ornamental appearance of a hat, shown in perspective from above and below with plan views, a front elevation and a side view whose opposite side is a mirror image.

US D892,457 is a design patent titled “Hat”, invented by Ding Hu Chen.

The application was filed on May 14, 2018 and granted on August 11, 2020, 2 years, 2 months later. The specification refers to 7 drawing figures.

It is one of the patents our firm has obtained in the Design — Apparel, Jewelry & Personal Items area.

Key dates and patent term

Application filedMay 14, 2018
Patent grantedAugust 11, 20202 years, 2 months in prosecution at the U.S. Patent Office
Design term expires (nominal)August 11, 203515 years from grant; design patents carry no maintenance fees.

The expiration date is calculated from the grant and filing dates on the face of the patent. The actual date may vary based on patent-term adjustment (patent office delay), or terminal disclaimer (agreeing to a shorter term). This website is for information purposes only and is not legal advice.

Bibliographic details

Patent numberUS D892,457
TitleHat
InventorsDing Hu Chen
AssigneeIndividual
Filing dateMay 14, 2018
Grant dateAugust 11, 2020
CategoryDesign — Apparel, Jewelry & Personal Items

Full text as published by the U.S. Patent Office

The sections below reproduce the official text of US D892,457 for reference. Open a section to read it.

Claims

Claims ( 1 )

CLAIM

The ornamental design for a hat, as shown and described.

Description

FIG. 1 is a top and side perspective view of a hat;

FIG. 2 is a bottom and side perspective view thereof;

FIG. 3 is a side elevation view thereof, the opposite side being a mirror image thereof;

FIG. 4 is a top plan view thereof;

FIG. 5 is a bottom plan view thereof;

FIG. 6 is a front elevation view thereof; and,

FIG. 7 is a rear elevation view thereof.

The portions of the hat illustrated in long even length broken lines and the unshaded areas within the long even length broken lines adjacent to the solid lines of the hat depict portions of the hat that form no part of the claimed design. The short dashed broken lines in FIGS. 2 and 5 form a boundary to the claimed design and form no part of the claimed design.

US D892,457: questions and answers

What is US Patent D892,457 about?

US D892,457, “Hat”, is a design patent granted by the United States Patent and Trademark Office on August 11, 2020.

Who invented US Patent D892,457?

The named inventor is Ding Hu Chen.

When was US Patent D892,457 filed?

The application was filed on May 14, 2018 and the patent granted on August 11, 2020.

When does US Patent D892,457 expire?

The nominal expiration date is August 11, 2035. 15 years from grant; design patents carry no maintenance fees.

Who was the patent attorney for US Patent D892,457?

This patent was prosecuted by Feigin & Fridman, LLC, patent attorneys in New York and New Jersey. Contact us to discuss protecting your own invention.

Other patents by Ding Hu Chen

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